US 8,000,827 B2 · Processing information management system in a plasma processing tool

Abstract

A plasma-processing tool for processing a substrate using at least a first process recipe and a second process recipe is provided. The plasma-processing tool includes transducers configured to collect process data streams, each process data stream pertaining to a process parameter being monitored during recipe execution. The tool also includes a logic circuitry configured for receiving a set of meta-data wherein each meta-data includes identification data about the substrate and the process recipe being executed. The logic circuitry is also configured for receiving a set of process data streams, each of which being associated with a specific process recipe. The logic circuitry further includes storing the meta-data and the process data streams associated with the first process recipe as a first file and the meta-data and the process data streams associated with the second process recipe as a second file.

Claims20

Dependent claims

An article of manufacture comprising a non-transitory program storage medium having computer readable code embodied therein, said computer readable code being configured for managing substrate processing data in a substrate processing environment, said substrate processing data being acquired while a substrate is processed in a plasma-processing chamber of a cluster tool, comprising:

computer readable code for receiving meta-data associated with said substrate, said meta-data identifying a process recipe employed to process said substrate;
computer readable code for receiving from a plurality of transducers a plurality of process data streams, each of said plurality of process data streams pertaining to a process parameter being monitored;
computer readable code for storing individual data items associated with said plurality of process data streams and said meta-data in a first file;
computer readable code for writing said first file to a process control computer as a written file;
computer readable code for pushing said written file as a pushed file via a first path to an application;
and
computer readable code for notifying said application via a second path that said pushed file is available.

4 more elements

A plasma-processing tool for processing at least a substrate using at least a first process recipe and a second process recipe, the plasma processing tool comprising:

a plurality of transducers configured to collect a plurality of process data streams, each of said plurality of process data streams pertaining to a process parameter being monitored when said substrate is being processed using at least one of said first process recipe and said second process recipe;
and
a logic circuitry configured for
receiving a first meta-data and a second meta-data, said first meta-data including first identification data about said substrate and said first process recipe, said second meta-data including second identification data about said substrate and said second process recipe,
receiving a first set of process data streams and a second set of process data streams, said first set of process data streams being associated with said first process recipe, said second set of process data streams being associated with said second process recipe,
storing said first set of process data streams and said first meta-data as a first file and storing said second set of process data streams and said second meta-data as a second file,
writing said first file to a process control computer as a written file,
pushing said written file as a pushed file via a first path to an application, and notifying said application via a second path that said pushed file is available.

5 more elements

A plasma processing information management system for managing substrate processing data acquired when a substrate is processed in a plasma-processing system, said plasma processing information management system comprising:

a module for collecting said substrate processing data, said substrate processing data including at least meta-data and a plurality of process data streams, wherein said meta-data representing identification data about said substrate and a process recipe, wherein said plurality of process data streams is associated with process parameters being monitored by a plurality of transducers while said substrate is being processed, wherein said meta-data and said plurality of process data streams are stored in a first file;
an equipment information management system (EIMS) configured for performing at least one of managing individual data items of said plurality of process data streams and managing communications related to said individual data items to a third party, said EIMS being further configured for receiving a registration from an application, said registration identifying a file type needed by said application, said EIMS being further configured for receiving a notification indicating that said first file in accordance with said file type has been created;
a process control computer configured for receiving said first file as a written file, said process computer being further configured for performing analysis of said first file, wherein said analysis is performed in real-time while said substrate is being processed to identify process irregularities;
and
a database for storing said first file,
wherein said EIMS is further configured for pushing said written file as a pushed file via a first path to said application, and
wherein said EIMS is further configured for notifying said application via a second path that said pushed file is available.

4 more elements

Dependencies are inferred from the claim text.

Processing information management system in a plasma processing tool

Life of this patent

Processing information management system in a plasma processing tool

Life of this patent

Abstract

Claims20