Methods for relaxation and transfer of strained layers and structures fabricated thereby

A method for forming islands of an at least partially relaxed strained material on a target substrate which comprises:

• forming islands from a strained material layer on an intermediate substrate by
• growing a strained material on a seed substrate;
• depositing a first low-viscosity layer on the strained material layer;
• bonding the first low-viscosity layer to the intermediate substrate;
• and
• transferring the strained material layer from the seed substrate to the intermediate substrate;
• depositing a second low-viscosity layer on the strained material;
• and
• patterning the second low-viscosity layer and the strained material;
• and
• performing a first heat treatment so as to at least partially relax the strained material of the formed islands.

A method for forming islands of an at least partially relaxed strained material on a target substrate which comprises:

• forming islands from a strained material layer on an intermediate substrate by
• growing a strained material on a seed substrate;
• depositing a first low-viscosity layer on the strained material layer;
• bonding the first low-viscosity layer to the intermediate substrate;
• implanting ions in the seed substrate;
• detaching the strained material from the seed substrate at the weakened layer by a third heat treatment to transfer it to the intermediate substrate;
• patterning the strained material layer so as to form strained material islands separated by interspaces;
• and
• performing a first heat treatment so as to at least partially relax the strained material of the formed islands.

A method for forming islands of an at least partially relaxed strained material on a target substrate which comprises:

• forming islands from a strained material layer on an intermediate substrate by:
• growing a strained material on a seed substrate;
• depositing a first low-viscosity layer on the strained material layer;
• bonding the first low-viscosity layer to the intermediate substrate;
• and
• transferring the strained material layer from the seed substrate to the intermediate substrate;
• and
• patterning the strained material layer so as to form strained material islands separated by interspaces;
• and
• performing a first heat treatment so as to at least partially relax the strained material of the formed islands;
• wherein the first low-viscosity layer is deposited subsequent to the patterning such that the first low-viscosity layer is deposited on the islands of strained material and in the interspaces separating the strained material islands.

A method for forming islands of an at least partially relaxed strained material on a target substrate which comprises:

• forming islands from a strained material layer on an intermediate substrate by
• growing a strained material on a seed substrate;
• depositing a first low-viscosity layer on the strained material layer;
• bonding the first low-viscosity layer to the intermediate substrate;
• and
• transferring the strained material layer from the seed substrate to the intermediate substrate;
• and
• patterning the strained material layer so as to form strained material islands separated by interspaces;
• and
• performing a first heat treatment so as to at least partially relax the strained material of the formed islands;
• wherein the patterning is performed subsequent to transferring to the intermediate substrate such that the interspaces extend down to the intermediate substrate with substantially no material of the first low-viscosity layer remaining on the bottoms of the interspaces.