# US 7,975,367 B2 · Method of manufacturing a thin-film magnetic head

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 7,975,367 B2
- Document ID: US7975367B2
- Status: Granted
- Kind: B2
- Application number: 12/591,299
- Filed: 2009-11-16
- Published: 2010-03-18
- Granted: 2011-07-12
- Earliest claimed: 2000-02-10
- Assignees: TDK Corporation
- Inventors: Yoshitaka Sasaki; Tohru Inoue
- Web page: https://patentgrep.com/patent/US7975367B2

## CPC

- G11B 5/3109: {Details (G11B5/3103 takes precedence)}
- B82Y 10/00: Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- B82Y 25/00: Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
- G11B 5/313: {Disposition of layers}
- G11B 5/3903: {using magnetic thin film layers or their effects, the films being part of integrated structures}
- G11B 5/3912: {Arrangements in which the active read-out elements are transducing in association with active magnetic shields, e.g. magnetically coupled shields (G11B5/3916 takes precedence)}
- G11B 5/3967: {Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read (G11B5/3906 takes precedence)}
- G11B 5/3163: {Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers}
- G11B 2005/3996: {large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices}
- Y10T 29/49021: Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
- Y10T 29/49032: Fabricating head structure or component thereof
- Y10T 29/49034: Treating to affect magnetic properties
- Y10T 29/49039: with dual gap materials
- Y10T 29/49043: Depositing magnetic layer or coating
- Y10T 29/49044: Plural magnetic deposition layers
- Y10T 29/49053: Multitrack heads having integral holding means
- Y10T 29/4906: Providing winding
- Y10T 29/49062: Multilayered winding
- Y10T 29/49064: by coating
- G11B: INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER (recording measured values in a way that does not require playback through a transducer G01D9/00; recording or playback apparatus using mechanically marked tape, e.g. punched paper tape, or using unit records, e.g. punched or magnetically marked cards G06K; transferring data from one type of record carrier to another G06K1/18; circuits for coupling output of reproducer to radio receiver H04B1/20; gramophone pick-ups or like acoustic electromechanical transducers or circuits therefor H04R)
- B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- Y10T: TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION

## Abstract

A method of manufacturing a magnetic head that includes a reproducing head, a recording head, and an isolation film for magnetically isolating the reproducing head and the recording head from each other. The method includes the steps of: forming the reproducing head; forming the recording head; and forming the isolation film. The isolation film is formed by stacking a plurality of insulating films formed by chemical vapor deposition.

## Claims

### Claim 1

A method of manufacturing a thin-film magnetic head comprising:
a medium facing surface that faces toward a recording medium;
a reproducing head incorporating: a magnetoresistive element; a first shield layer and a second shield layer for shielding the magnetoresistive element, the shield layers having portions located on a side of the medium facing surface and opposed to each other, the magnetoresistive element being placed between these portions of the shield layers; a first shield gap film, provided between the magnetoresistive element and the first shield layer, for insulating the magnetoresistive element and the first shield layer from each other; and a second shield gap film, provided between the magnetoresistive element and the second shield layer, for insulating the magnetoresistive element and the second shield layer from each other;
a recording head incorporating: a first magnetic layer including a pole portion and a second magnetic layer including a pole portion, the first and second magnetic layers being magnetically coupled to each other, the pole portions being opposed to each other and placed in regions of the magnetic layers on a side of the medium facing surface, each of the magnetic layers including at least one layer; a gap layer provided between the pole portions of the first and second magnetic layers; and a thin-film coil at least a part of which is placed between the first and second magnetic layers, the at least part of the coil being insulated from the first and second magnetic layers; and
an isolation film for magnetically isolating the reproducing head and the recording head from each other; the method including the steps of:
forming the reproducing head by forming the magnetoresistive element, the first and second shield layers and the first and second shield gap films;
forming the recording head by forming the first and second magnetic layers, the gap layer and the thin-film coil; and
forming the isolation film, wherein:
the isolation film is formed by stacking a plurality of insulating films formed by chemical vapor deposition; and
each of the insulating films has a thickness of 0.1 to 0.2 nm.

### Claim 2 (depends on 1)

The method according to claim 1, wherein the insulating films formed by the chemical vapor deposition are alumina films.

### Claim 3 (depends on 1)

The method according to claim 1, wherein the chemical vapor deposition is low pressure chemical vapor deposition.

### Claim 4 (depends on 1)

The method according to claim 1, wherein the chemical vapor deposition is plasma chemical vapor deposition or atmospheric pressure chemical vapor deposition.

### Claim 5 (depends on 1)

The method according to claim 1, wherein the insulating films formed by the chemical vapor deposition are formed through the use of a plurality of chambers.

### Claim 6 (depends on 1)

The method according to claim 1, wherein the insulating films formed by the chemical vapor deposition are formed through intermittently injecting a material for making the films.

### Claim 7 (depends on 6)

The method according to claim 6, wherein the insulating films formed by the chemical vapor deposition are alumina films formed through injecting a first material and a second material in an alternate manner, wherein the first material is selected from the group consisting of H2O, N2O and H2O2 and the second material is selected from the group consisting of Al(CH3)3 and AlCl3.

### Claim 8 (depends on 1)

The method according to claim 1, wherein the insulating films formed by the chemical vapor deposition are formed at a temperature in a range of 100 to 350° C.

### Claim 9

A method of manufacturing a thin-film magnetic head comprising:
a medium facing surface that faces toward a recording medium;
a reproducing head;
a recording head; and
an isolation film for magnetically isolating the reproducing head and the recording head from each other, the method including the steps of:
forming the reproducing head;
forming the recording head; and
forming the isolation film, wherein:
the isolation film is formed by stacking a plurality of insulating films formed by chemical vapor deposition; and
each of the insulating films has a thickness of 0.1 to 0.2 nm.