Plasma display panel having a phosphor layer that is at least partly covered with a material higher in secondary electron emission and production method therefore

A plasma display panel including a first substrate and a second substrate arranged to face each other with a space therebetween, and including a phosphor layer in an area of the first substrate that faces toward the space, wherein

• a surface of the phosphor layer is covered with a high gamma member being a film that is made of a material having a higher secondary electron emission coefficient than a material of the phosphor layer, and
• a film thickness of the high gamma member is in a range of 1 nm to 10 nm inclusive, wherein
• the space that exists between the first substrate and the second substrate has been filled with a discharge gas that contains Xe, and
• a ratio of partial pressure of Xe to a total pressure of the discharge gas is in a range of 5% to 100% inclusive, wherein
• a coverage ratio of the high gamma member to the surface of the phosphor layer is in a range of 3% to 20% inclusive.

A manufacturing method of a plasma display panel that includes a first substrate and a second substrate arranged to face each other with a space therebetween, and includes a phosphor layer in an area of the first substrate that faces toward the space, the manufacturing method comprising the steps of:

• forming the phosphor layer on a surface of the first substrate that are to face the second substrate;
• forming a high gamma member on part of a surface of the phosphor layer, using a material that has a higher secondary electron emission coefficient than a material of the phosphor layer, wherein in the high gamma member forming step, the high gamma member is formed so that both the high gamma member and a remaining area of the surface of the phosphor layer are exposed to the space;
• sealing the first substrate and the second substrate at peripheries thereof;
• and
• filling a discharge gas that includes Xe in the space, wherein a ratio of a partial pressure of Xe to a total pressure of the discharge gas is in a range of 5% to 100% inclusive, wherein
• in the high gamma member forming step, the high gamma member is formed so that a coverage ratio of the high gamma member to the surface of the phosphor layer is in a range of 3% to 20% inclusive.

A manufacturing method of a plasma display panel that includes a first substrate and a second substrate arranged to face each other with a space therebetween, and includes a phosphor layer in an area of the first substrate that faces toward the space, the manufacturing method comprising the steps of:

• forming the phosphor layer on a surface of the first substrate that are to face the second substrate;
• forming a high gamma member as a film on a surface of the phosphor layer, using a material that has a higher secondary electron emission coefficient than a material of the phosphor layer, wherein in the high gamma member forming step, the high gamma member is formed so that a film thickness of the high gamma member is in a range of 1 nm to 10 nm inclusive;
• sealing the first substrate and the second substrate at peripheries thereof;
• and
• filling a discharge gas that includes Xe in the space, wherein a ratio of a partial pressure of Xe to a total pressure of the discharge gas is in a range of 5% to 100% inclusive, wherein
• in the high gamma member forming step, the high gamma member is formed so that a coverage ratio of the high gamma member to the surface of the phosphor layer is in a range of 3% to 20% inclusive.