Single scan irradiation for crystallization of thin films
AssigneeThe Trustees of Columbia University in the City of New York
InventorsJames S. Im, Paul C. Van Der Wilt
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AssigneeThe Trustees of Columbia University in the City of New York
InventorsJames S. Im, Paul C. Van Der Wilt
Estimating the term…
A method of processing a polycrystalline film on a substrate includes generating laser pulses, directing the laser pulses through a mask to generate patterned laser beams, each having a length l′, a width w′, and a spacing between adjacent beams d′; irradiating a region of the film with the patterned beams, said beams having an intensity sufficient to melt and to induce crystallization of the irradiated portion of the film, wherein the film region is irradiated n times; and after irradiation of each film portion, translating the film and/or the mask, in the x- and y-directions. The distance of translation in the y-direction is about l′/n-δ, where δ is a value selected to overlap the beamlets from one irradiation step to the next. The distance of translation in the x-direction is selected such that the film is moved a distance of about λ′ after n irradiations, where λ′=w′+d′.
A method of processing a selected region of a film on a substrate in a single scan, comprising:
Dependencies are inferred from the claim text.