Piezoelectric device having a ferroelectric film including a solid solution
AssigneeSeiko Epson Corporation
InventorsEiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
Life of this patent
Estimating the term…
Loading patent…
AssigneeSeiko Epson Corporation
InventorsEiji Natori, Takeshi Kijima, Koichi Furuyama, Yuzo Tasaki
Estimating the term…
A method of manufacturing a ceramic includes forming a film which includes a complex oxide material having an oxygen octahedral structure and a paraelectric material having a catalytic effect for the complex oxide material in a mixed state, and performing a heat treatment to the film, wherein the paraelectric material is one of a layered catalytic substance which includes Si in the constituent elements and a layered catalytic substance which includes Si and Ge in the constituent elements. The heat treatment includes sintering and post-annealing. At least the post-annealing is performed in a pressurized atmosphere including at least one of oxygen and ozone. A ceramic is a complex oxide having an oxygen octahedral structure, and has Si and Ge in the oxygen octahedral structure.
A piezoelectric device having a lower electrode, a ferroelectric film and an upper electrode, the ferroelectric film including a solid solution that includes:
Dependencies are inferred from the claim text.