Photosensitive resin composition, method for preparing the same, and dry film resist comprising the same
AssigneeDongjin Semichem Co., Ltd.
InventorsIn-Ho Yoon, Bong-Gi Kim, Chang-Seok Rho, Sang-Ki Kang, Kyung-Rock Byun, Chan-Seok Park
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Abstract
The present invention relates to a photosensitive resin composition including a) an alkali-soluble acrylate resin, b) a cross-linking monomer having at least two ethylenic double bonds, and c) a phosphinoxide based photopolymerization initiator and an acridon based photopolymerization initiator; a preparation method thereof; and a dry film resist comprising the same.
Claims20
A photosensitive resin composition comprising a) 100 parts by weight of an alkali-soluble acrylate resin, b) 40 to 100 parts by weight of a cross-linking monomer having at least two ethylenic double bonds, c) 1.5 to 7 parts by weight of the mixture of a phosphine oxide based photopolymerization initiator and an acridon based photopolymerization initiator, wherein the alkali-soluble acrylate resin is prepared by polymerizing a mixture of 20 to 50 weight % of an unsaturated carboxylic acid monomer, 15 to 45 weight % of an aromatic monomer, 1 to 15 weight % of a phosphate ester-containing monomer, and 10 to 50 weight % of an aliphatic acrylic monomer,
- wherein the phosphine oxide based photopolymerization initiator is at least one compound selected from the group consisting of the compounds represented by the following formula 1:
- wherein, R1 is a phenyl, alkyl, or trialkylbenzoyl group, R2 is independently a C1 to C6 alkyl group, and n is an integer of 0 to 3,
- wherein the acridon based photopolymerization initiator is at least one compound selected from the group consisting of 10-methylacridone, 10-butyl-2-chloroacridone, 10-butyl-2-isopropylacridone, and the compounds represented by the following formula 2:
- wherein, R3 is a C1 to C6 alkyl, R4 is a C1 to C2 alkyl or a halogen, and R5 is a C1 to C2 alkyl or a halogen.
A method of preparing a photosensitive resin composition comprising the steps of:
- polymerizing an unsaturated carboxylic acid monomer, an aromatic monomer, a phosphate ester-containing monomer, and an aliphatic acrylic monomer to produce an alkali-soluble acrylate resin;
- and
- mixing the alkali-soluble acrylate resin, a cross-linking monomer having at least two ethylenic double bonds, a phosphine oxide based photopolymerization initiator, and an acridon based photopolymerization initiator,
- wherein the phosphine oxide based photopolymerization initiator is at least one compound selected from the group consisting of the compounds represented by the following formula 1:
- wherein, R1 is a phenyl, alkyl, or trialkylbenzoyl group, R2 is independently a C1 to C6 alkyl group, and n is an integer of 0 to 3,
- wherein the acridon based photopolymerization initiator is at least one compound selected from the group consisting of 10-methylacridone, 10-butyl-2-chloroacridone, 10-butyl-2-isopropylacridone, and the compounds represented by the following formula 2:
- wherein, R3 is a C1 to C6 alkyl, R4 is a C1 to C2 alkyl or a halogen, and R5 is a C1 to C2 alkyl or a halogen.
Dependencies are inferred from the claim text.