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AssigneeHitachi High-Technologies Corporation
InventorsAkiyuki Sugiyama, Hiroyuki Shindo, Hitoshi Komuro, Takumichi Sutani, Hidetoshi Morokuma
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A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
A pattern matching method for matching between a design data-based first image of an object sample, and a second image, comprising steps of:
A non-transitory computer-readable recording medium carrying a program, wherein execution of the program causes a computer to perform matching between a design data-based first image of an objective sample and a second image, wherein the matching including functions comprising:
A scanning electron microscope equipped with a computer which executes matching between a design data-based first image of an object sample, and a second image obtainable by scanning electron beams,
Dependencies are inferred from the claim text.