Surface emitting laser, manufacturing method of surface emitting laser, surface emitting laser array, manufacturing method of surface emitting laser array, and optical apparatus including surface emitting laser array

A manufacturing method of a surface emitting laser in which a lower reflection mirror, an active layer, and an upper reflection mirror are successively laminated on a substrate,

• in which there is formed, in a light emitting section of the upper reflection mirror, a structure for controlling reflectance that is configured by a low reflectance region and a concave high reflectance region formed in the central portion of the low reflectance region, and which oscillates at a wavelength of λ, the manufacturing method comprising:
• forming, when a multilayer film reflection mirror based on a laminated structure is formed as the upper reflection mirror,
• an absorption layer causing band-to-band absorption on the surface side in the laminated structure from a layer laminated at the middle point in thickness of the laminated structure;
• measuring reflection spectra by irradiating the laminated structure with light;
• measuring a broad dip wavelength obtained by measuring the reflection spectra;
• forming, after the multilayer film reflection mirror as the upper reflection mirror is formed, a phase adjusting layer for reducing reflectance on the multilayer film reflection mirror;
• and
• adjusting the thickness of the phase adjusting layer based on the dip wavelength.

A manufacturing method of a surface emitting laser in which a lower reflection mirror, an active layer, and an upper reflection mirror are successively laminated on a substrate,

• in which there is formed, in a light emitting section of the upper reflection mirror, a structure for controlling reflectance that is configured by a low reflectance region and a concave high reflectance region formed in the central portion of the low reflectance region, and which oscillates at a wavelength of λ, the manufacturing method comprising:
• forming, as the upper reflection mirror, a multilayer film reflection mirror based on a laminated structure;
• forming, on the multilayer film reflection mirror, a phase adjusting layer which is for reducing the reflectance and which includes an absorption layer having an absorption coefficient of 5000 cm−1 or more for the wavelength λ;
• measuring reflection spectra by irradiating the surface of the phase adjusting layer with light;
• measuring a broad dip wavelength obtained by measuring the reflection spectra;
• and
• adjusting the thickness of the phase adjusting layer based on the dip wavelength.

A manufacturing method of a surface emitting laser in which a lower reflection mirror, an active layer, and an upper reflection mirror are successively laminated on a substrate,

• in which there is formed, in a light emitting section of the upper reflection mirror, a structure for controlling reflectance that is configured by a low reflectance region and a concave high reflectance region formed in the central portion of the low reflectance region, and which oscillates at a wavelength of λ, the manufacturing method comprising:
• forming, when a multilayer film reflection mirror based on a laminated structure is formed as the upper reflection mirror,
• an absorption layer having an absorption coefficient of 5000 cm−1 or more for the wavelength λ on the surface side in the laminated structure from a layer laminated at the middle point in thickness of the laminated structure;
• measuring reflection spectra by irradiating the laminated structure with light;
• measuring a broad dip wavelength obtained by measuring the reflection spectra;
• forming, after the multilayer film reflection mirror as the upper reflection mirror is formed, a phase adjusting layer for reducing reflectance on the multilayer film reflection mirror;
• and
• adjusting the thickness of the phase adjusting layer based on the dip wavelength.