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US 7,924,416 B2Granted
Measurement apparatus, exposure apparatus, and device manufacturing method
AssigneeNikon Corporation
InventorIkuo Hikima
Life of this patent
Estimating the term…
Abstract
A substrate stage holds a substrate irradiated with exposure light via a liquid. A measurement apparatus measures information on the exposure light and has a light receiving device detachable from the substrate stage. The light receiving device receives the exposure light while being held in the substrate stage.
Claims5
A wafer-shaped sensor used in an exposure apparatus that exposes a wafer via a liquid, the wafer-shaped sensor comprising:
- a light transmission portion that transmits an exposure light having a wavelength of less than 200 nm;
- a receiving portion onto which the exposure light is incident via the liquid and the light transmission portion, wherein the wafer-shaped sensor can be detachably held on a wafer holder which holds the wafer subjected to exposure via the liquid;
- and
- a base portion that surrounds the light transmission portion,
- wherein a protection film having a repellency to liquid is formed on an upper surface of the base portion, the protection film extending to an outer periphery of the light transmission portion, and
- the light transmission portion is above the receiving portion and extends beyond an outer periphery of the receiving portion.
3 more elements
Dependencies are inferred from the claim text.