Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels

An illuminator for a lithographic apparatus, the illuminator comprising:

• a first and a second illuminator channel, each of the first and the second illuminator channel including elements which are adjustable to provide a radiation beam with at least one desired property;
• a first switch device arranged to switch the radiation beam between the first and second illuminator channels;
• an additional illuminator part and a second switch device, the second switch device arranged to receive the radiation beam from the first and second illuminator channels and direct the radiation beam through the additional illuminator part, the additional illuminator part including elements which apply at least one additional desired property to the radiation beam;
• wherein each of the first and the second switch devices comprises a first and a second moveable mirrors with different orientations, the first and second mirrors of each of the first and the second switch devices being moveable between a first location in which the first mirror is positioned to reflect the radiation beam and a second location in which the second mirror is positioned to reflect the radiation beam.

An illuminator for a lithographic apparatus, the illuminator comprising:

• a first and a second illuminator channel, each of the first and the second illuminator channel including elements which are adjustable to provide a radiation beam with at least one desired property;
• a switch mechanism configured to receive the radiation beam and arranged to direct the radiation beam between the first and second illuminator channels, said switch mechanism being configured, when arranged in the illuminator, to move independently from, and relative to, the first and second illuminator channels to direct the radiation beam between the first and second illuminator channels;
• an additional illuminator part, the switch mechanism arranged to receive the radiation beam from the first and second illuminator channels and direct the radiation beam through the additional illuminator part, the additional illuminator part including elements which apply at least one additional desired property to the radiation beam,
• wherein the switch mechanism comprises a moveable plate including a first region comprising a ½ wave plate and a second region which does not affect polarization, the switch mechanism further comprising ¼ wave plates located on either side of the moveable plate, and polarizing beam splitters located on either end of the first and second illuminator channels, the moveable plate moveable between a first position in which the polarization of the radiation beam is rotated such that the polarizing beam splitter directs the radiation beam into the first illuminator channel, and a second position in which the polarization of the radiation beam is not rotated, such that the polarizing beam splitter directs the radiation beam into the second illuminator channel.

A lithographic apparatus comprising:

• an illuminator including
• a first and a second illuminator channel, each of the first and the second illuminator channel including elements which are adjustable to provide a radiation beam with at least one desired property;
• a first switch device configured to receive the radiation beam and arranged to direct the radiation beam between the first and second illuminator channels, said first switch device being configured, when arranged in the illuminator, to move independently from and relative to, the first and second illuminator channels to direct the radiation beam between the first and second illuminator channels;
• an additional illuminator part and a second switch device, the second switch device arranged to receive the radiation beam from the first and second illuminator channels and direct the radiation beam through the additional illuminator part, the additional illuminator part including elements which apply at least one additional desired property to the radiation beam, wherein the first switch device comprises a moveable mirror that is rotatable between a first and a second position so as to direct the radiation beam between the first and second illuminator channels, and wherein the second switch device comprises a second moveable mirror that is rotatable between different positions so as to reflect the radiation beam outputted by the first or the second illuminator channel;
• a support constructed to support a patterning device, the patterning device being configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
• a substrate table constructed to hold a substrate;
• and
• a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

A method of applying desired properties to a radiation beam, the method comprising:

• adjusting elements of a first illuminator channel of an illuminator to apply at least one desired property to a radiation beam;
• adjusting elements of a second illuminator channel of the illuminator to apply at least one different desired property to the radiation beam;
• adjusting elements of an additional part of the illuminator to apply at least one additional desired property to the radiation beam;
• using a first switch device configured to receive the radiation beam and to alternately direct the radiation beam through the first and second illuminator channel, said first switch device being configured, when arranged in the illuminator, to move independently from, and relative to, the first and second illuminator channels to direct the radiation beam between the first and second illuminator channels, and
• using a second switch device configured to receive the radiation beam from the first and second illuminator channels and to direct the radiation beam through the additional part of the illuminator,
• wherein the first switch device comprises a moveable mirror that is rotatable between a first and a second position so as to direct the radiation beam between the first and second illuminator channels, and wherein the second switch device comprises a second moveable mirror that is rotatable between different positions so as to reflect the radiation beam outputted by the first or the second illuminator channel.