Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods
AssigneeASML Netherlands B.V.
InventorsRonald Van Der Ham, Tjarko Adriaan Rudolf Van Empel, Herman Vogel, Niek Jacobus Johannes Roset
Life of this patent
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Abstract
An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
Claims28
An assembly comprising a conditioning system and an object, the conditioning system comprising fluid outlet passages to supply conditioning fluid to an area to be conditioned, at least part of the object being movable into and/or out of the area to be conditioned, wherein the conditioning system is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object, and wherein the conditioning system is configured such that, during use, a static pressure at an upstream inlet of each of the fluid outlet passages is about the same as a dynamic pressure at a respective downstream outlet side of the fluid outlet passage.
A conditioning system, comprising:
- a first fluid distribution chamber;
- and
- a second fluid distribution chamber comprising a plurality of fluid outlet passages in a downstream part of the second chamber, the fluid outlet passages configured such that, during use, the Reynolds number of fluid flowing through each of the fluid outlet passages is smaller than about 150,
- wherein the first distribution chamber comprises a fluid flow regulator configured to distribute fluid from the first chamber homogeneously into the second chamber, such that during use, a static pressure at an upstream inlet of each of the fluid outlet passages is about the same as a dynamic pressure at a respective downstream outlet side of the fluid outlet passage.
A lithographic apparatus, comprising an assembly comprising a conditioning system and an object, the conditioning system comprising fluid outlet passages to supply conditioning fluid to an area to be conditioned, at least part of the object being movable into and/or out of the area to be conditioned, wherein the conditioning system is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object, and wherein the conditioning system is configured such that, during use, a static pressure at an upstream inlet of each of the fluid outlet passages is about the same as a dynamic pressure at a respective downstream outlet side of the fluid outlet passage.
A lithographic apparatus comprising:
- a conditioning system that includes:
- a first fluid distribution chamber;
- and
- a second fluid distribution chamber comprising a plurality of fluid outlet passages in a downstream part of the second chamber, the fluid outlet passages configured such that, during use, the Reynolds number of fluid flowing through each of the fluid outlet passages is smaller than about 150,
- wherein the first distribution chamber comprises a fluid flow regulator configured to distribute fluid from the first chamber homogeneously into the second chamber, such that during use, a static pressure at an upstream inlet of each of the fluid outlet passages is about the same as a dynamic pressure at a respective downstream outlet side of the fluid outlet passage.
A method for conditioning an area, the method comprising:
- supplying conditioning fluid to an area to be conditioned using a plurality of fluid outlet passages of a conditioning system;
- and
- adjusting outflow of the conditioning fluid from the fluid outlet passages depending on a position of an object at least partly movable into and/or out of the area to be conditioned, wherein the conditioning system is configured such that, during use, a static pressure at an upstream inlet of each of the fluid outlet passages is about the same as a dynamic pressure at a respective downstream outlet side of the fluid outlet passage.
A lithographic device manufacturing method, comprising:
- illuminating a target portion of a substrate with a patterned projection beam, the substrate being held by a substrate support;
- conditioning an area near the substrate support with a conditioning system comprising fluid outlet passages to supply conditioning fluid to the area to be conditioned;
- moving the substrate support at least partially into and/or out of the area to be conditioned;
- and
- varying outflow of the conditioning fluid from a number of the fluid outlet passages depending on a position of the substrate support, wherein the conditioning system is configured such that, during use, a static pressure at an upstream inlet of each of the fluid outlet passages is about the same as a dynamic pressure at a respective downstream outlet side of the fluid outlet passage.
Dependencies are inferred from the claim text.