Anti-corrosion layer on objective lens for liquid immersion lithography applications
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsBurn Jeng Lin, David Lu
Life of this patent
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Abstract
Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of anti-corrosion coating (ACC). The ACC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.
Claims21
A liquid immersion photolithography system, comprising:
- a light source providing a wavelength of light;
- a lens comprising:
- a transparent substrate configured for at least partial immersion in a liquid during liquid immersion photolithography and for illumination wavelength of light when so immersed, wherein the liquid includes water;
- and
- a layer of anti-corrosion coating (ACC) formed directly on the transparent substrate, wherein the ACC is positioned between the liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid and wherein the ACC comprises a material selected for its chemical stability with the liquid;
- at least one layer of antireflection coating (ARC), wherein the ARC is proximate to the opposite surface of the transparent substrate relative to the ACC layer;
- and
- a chamber operable to hold the liquid, wherein the liquid contacts the lens.
A liquid immersion lithography system, comprising:
- a light source, wherein the light source provides a predetermined wavelength of light in the range between about 100 nm and about 500 nm;
- a lens including:
- a transparent substrate configured for at least partial immersion in an immersion liquid and for illumination by the predetermined wavelength of light when so immersed;
- and
- an anti-corrosion coating (ACC) layer formed directly on a surface of the transparent substrate, wherein the ACC layer is adapted to protect the transparent substrate from damage when the transparent substrate is immersed in the immersion liquid and wherein the ACC comprises a material selected for its chemical stability with the immersion liquid;
- an antireflection coating (ARC), wherein the ARC is proximate to the opposite surface of the transparent substrate relative to the ACC layer;
- and
- the immersion liquid, wherein the immersion liquid includes water.
A lens adapted for illumination by a predetermined wavelength of light during liquid immersion photolithography, the lens comprising:
- a transparent substrate configured for at least partial immersion in a liquid during liquid immersion photolithography and for illumination by a predetermined wavelength of light when so immersed;
- a layer of anti-corrosion coating (ACC) formed directly on the transparent substrate, wherein the ACC is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid and wherein the ACC comprises a material selected for its chemical stability with the liquid and comprises a non-photo-active resin;
- and
- an antireflection coating (ARC), wherein the ARC is proximate to the opposite surface of the transparent substrate relative to the ACC layer.
Dependencies are inferred from the claim text.