Method for producing liquid crystal display device

A method for producing a liquid crystal display device including first and second substrates, a first alignment layer formed on the first substrate, and a second alignment layer formed on the second substrate, liquid crystal filled between the first and second substrates, said method comprising:

• a first ultraviolet ray irradiation step of conducting an alignment-treatment for realizing an alignment of liquid crystals in a first azimuth direction on the first alignment layer by obliquely irradiating the first substrate with ultraviolet rays,
• a second ultraviolet ray irradiation step of conducting an alignment-treatment for realizing an alignment of liquid crystals in a second azimuth direction, which is different from the first azimuth direction, by obliquely irradiating a region of the first substrate where ultraviolet ray irradiation has not been conducted in the first ultraviolet ray irradiation step with ultraviolet rays in an azimuth direction that is 180 degrees different from an azimuth direction of ultraviolet ray irradiation in the first ultraviolet ray irradiation step,
• a third ultraviolet ray irradiation step of conducting an alignment-treatment for realizing an alignment of liquid crystals in a third azimuth direction on the second alignment layer by obliquely irradiating the second substrate with ultraviolet rays, and
• a sticking step of sticking together the first and second substrates such that the first azimuth direction of the first alignment layer and the third azimuth direction of the second alignment layer are perpendicular to each other,
• wherein in the first and second ultraviolet ray irradiation steps, the first substrate is obliquely irradiated with ultraviolet rays, through a mask having stripe-shaped light shielding areas and openings, in an azimuth direction parallel to a longer direction of the strip-shaped opening, and
• wherein in the second ultraviolet ray irradiation step is conducted after a position of the mask is shifted by a width of a stripe of the mask relative to the first substrate.