Extreme ultra violet light source apparatus
AssigneeGigaphoton Inc.
InventorsMasato Moriya, Tamotsu Abe, Takashi Suganuma, Hiroshi Someya, Takayuki Yabu, Akira Sumitani, Osamu Wakabayashi
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AssigneeGigaphoton Inc.
InventorsMasato Moriya, Tamotsu Abe, Takashi Suganuma, Hiroshi Someya, Takayuki Yabu, Akira Sumitani, Osamu Wakabayashi
Estimating the term…
An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
An extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target material to turn the target material into plasma, said apparatus comprising:
An extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target material to turn the target material into plasma, said apparatus comprising:
An extreme ultra violet light source apparatus for generating extreme ultra violet light by applying a laser beam to a target material to turn the target material into plasma, said apparatus comprising:
Dependencies are inferred from the claim text.