Semiconductor cleaning using superacids
AssigneeAdvanced Process Technologies, Inc.
InventorRobert J. Small
Life of this patent
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Abstract
A method of cleaning a substrate includes contacting a surface of a semiconductor substrate with a composition comprising a superacid. The semiconductor substrate may be a wafer.
Claims19
A method of cleaning post etch residue from submicron features on a semiconductor substrate comprising contacting a surface of the semiconductor substrate with a composition comprising a superacid, wherein the superacid includes a mixture of FSO3H, SbF5, and SO2;
- a mixture of HF and BF3;
- or a mixture of SbF5 and HF.
A process for removing post etch residue from submicron features on an integrated circuit, which comprises contacting the integrated circuit with a composition comprising a superacid at a temperature and for a time sufficient to remove the residue from the integrated circuit, wherein the superacid includes a mixture of FSO3H, SbF5, and SO2;
- a mixture of HF and BF3;
- or a mixture of SbF5 and HF.
A method of removing post etch residue from submicron features on a semiconductor wafer comprising contacting the semiconductor wafer with a composition comprising a superacid at a temperature and for a time sufficient to dislodge residue therefrom, wherein the superacid includes a mixture of FSO3H, SbF5, and SO2;
- a mixture of HF and BF3;
- or a mixture of SbF5 and HF.
A method of removing post etch residue from submicron features on a semiconductor wafer comprising contacting the semiconductor wafer with a composition comprising a superacid at a temperature and for a time sufficient to strip photoresist therefrom, wherein the superacid includes a mixture of FSO3H, SbF5, and SO2;
- a mixture of HF and BF3;
- or a mixture of SbF5 and HF.
An integrated circuit fabrication process comprising:
- etching a semiconductor layer on a wafer;
- applying a superacid to the wafer to remove post etch residues from submicron features on the wafer;
- and
- rinsing the wafer with water;
- wherein the superacid includes a mixture of FSO3H, SbF5, and SO2;
- a mixture of HF and BF3;
- or a mixture of SbF5 and HF.
Dependencies are inferred from the claim text.