Compositions for processing of semiconductor substrates
AssigneeAdvanced Technology Materials, Inc.
InventorsElizabeth Walker, Shahri Naghshineh, Jeff Barnes, Ewa Oldak
Life of this patent
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Abstract
Compositions useful in semiconductor manufacturing for surface preparation and/or cleaning of wafer substrates such as semiconductor device precursor structures. The compositions can be employed for processing of wafers that have, or are intended to be further processed to include, copper metallization, e.g., in operations such as surface preparation, pre-plating cleaning, post-etching cleaning, and post-chemical mechanical polishing cleaning of semiconductor wafers. The compositions contain (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, and are storage-stable, as well as non-darkening and degradation-resistant in exposure to oxygen.
Claims35
A composition comprising (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, wherein the complexing agent includes at least one component selected from the group consisting of glyoxylic acid, 2-mercaptobenzimidazole, proline, and derivatives of the foregoing amino acids, with the provision that the complexing agent does not include citric acid, and wherein the composition has a pH greater than 9.
A method of processing a semiconductor substrate to remove undesired material therefrom or to prepare a surface of said semiconductor substrate for subsequent treatment, said method comprising contacting the semiconductor substrate with an effective amount of a composition comprising (i) alkanolamine, (ii) quaternary ammonium hydroxide and (iii) a complexing agent, wherein the complexing agent includes at least one component selected from the group consisting of glyoxylic acid, 2-mercaptobenzimidazole, proline, and derivatives of the foregoing amino acids, with the provision that the complexing agent does not include citric acid, and wherein the composition has a pH greater than 9.
A composition comprising (i) alkanolamine, (ii) quaternary ammonium hydroxide, (iii) a complexing agent and (iv) water, wherein the complexing agent includes at least one component selected from the group consisting of 2-mercaptobenzimidazole, proline, and derivatives of the foregoing amino acids, with the provision that the complexing agent does not include citric acid, and wherein the composition has a pH greater than 9.
Dependencies are inferred from the claim text.