Processes for forming electronic devices including spaced-apart radiation regions

A process for forming an electronic device, the process comprising:

• patterning an insulating layer, wherein;
• the patterned insulating layer defines a plurality of openings within the insulating layer;
• and
• an opening of the plurality of openings lie within an insulating region, the insulating region having a first side and a second side opposite the first side, wherein:
• a first radiation region lies immediately adjacent to the first side;
• a second radiation region lies immediately adjacent to the second side;
• and
• within an insulating region, no other radiation region lies between the first and the second sides of a radiation region;
• forming a first liquid composition at a first location overlying a substrate, wherein the first liquid composition includes a first portion and a second portion, wherein:
• the first portion of the first liquid composition lies within the first radiation region;
• the second portion of the first liquid composition substantially fills a first opening of the plurality of openings;
• and
• substantially none of the first liquid composition is formed within a second opening of the plurality of openings.