Non-volatile resistance switching memory
AssigneeInternational Business Machines Corporation
InventorsRolf Allenspach, Johannes G. Bednorz, Gerhard Ingmar Meijer, Chung Hon Lam, Richard Stutz, Daniel Widmer
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Abstract
A microelectronic device or non-volatile resistance switching memory comprising the switching material for storing digital information. A process includes a step of depositing the switching material by a CMOS deposition technique at a temperature lower than 400° C.
Claims1
A program storage device readable by a computer, said device tangibly embodying a program of instructions executable by the computer to perform steps for controlling deposition of a switching material, said steps of controlling comprising steps of:
- depositing over a substrate a non-volatile resistance switching transition metal oxide-material, said switching material being reversibly switchable between at least a first conductivity state and a second conductivity state, each of the states being persistent, wherein the transition metal oxide material is selected from the group consisting of SrTiO3 doped with Chromium and SrZrO3 doped with Chromium;
- wherein depositing the switching material comprises depositing said switching material by a CMOS deposition technique at a temperature lower than 100° C., using a mixture of at least Argon and Oxygen gases in a range of Ar:O2 between 5:1 and 1:5, giving said switching material an amorphous structure resulting from the used deposition temperature such that no post-deposition annealing process is required.
Dependencies are inferred from the claim text.