Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

A photosensitive composition comprising (A) a compound capable of generating an organic acid represented by the following formula (I) upon irradiation with actinic rays or radiation:

• HO3S-A-(X)n—B—R (I)
• wherein
• A represents a divalent linking group having at least one fluorine atom,
• X represents —SO2— or —CO—,
• n represents 0 or 1,
• B represents a single bond, an oxygen atom or —N(Rx)-,
• Rx represents a hydrogen atom or a monovalent organic group,
• R represents a monovalent organic group containing a proton acceptor functional group, or a monovalent organic group containing an ammonium group, wherein said proton acceptor functional group is a functional group having a cyclic polyether structure or a functional group containing a nitrogen atom having a lone electron pair not contributing to π-conjugation, and
• when B is —N(Rx)-, R and Rx may combine to form a ring;
• and said compound has at least one fluorine atom.