Substrate with film and glass for formation film
AssigneeAsahi Glass Company, Limited
InventorsKensuke Nagai, Kei Maeda
Life of this patent
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AssigneeAsahi Glass Company, Limited
InventorsKensuke Nagai, Kei Maeda
Estimating the term…
A substrate with film and a glass for forming such a film are provided, wherein the film has high gas barrier property, high transmittance in visible light region, and high productivity since the film provides effective gas barrier property even if the film is a single layer. A substrate with film having an inorganic amorphous film having a softening temperature of from 100 to 800° C. formed on at least one surface of a substrate; or a substrate with film having an inorganic amorphous film having a glass transition temperature of from 50 to 500° C. formed on at least one surface of a substrate. Further, a glass for forming film composed of a borate glass containing B2O3 as the main component, a phosphate glass containing P2O5, a tellurite type composition containing TeO2 as the main component, a bismuth oxide type composition containing Bi2O3 as the main component or a chalcogenide type composition containing at least one type of element selected from the group consisting of S, Se and Te.
A substrate with film comprising:
A substrate with film comprising:
Dependencies are inferred from the claim text.