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US 7,922,818 B2Granted
Method and system for binding halide-based contaminants
AssigneeMicron Technology, Inc.
InventorsGaro J. Derderian, Cem Basceri, Donald L. Westmoreland
Life of this patent
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Abstract
A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the halide adsorbing material is also provided.
Claims10
A deposition chamber comprising:
- a solid material configured to adsorb a halide byproduct of a reaction of a titanium halide and a precursor, wherein the solid material is disposed within and coupled to the deposition chamber.
A removable component for use in a deposition chamber, comprising:
- a solid substrate configured to be removably secured to an interior of the deposition chamber via a fastener;
- and
- a material configured to adsorb halide-based products of a reaction forming a titanium-based film, wherein the removable component is a removable liner.
Dependencies are inferred from the claim text.