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US 7,922,554 B2Granted
Production apparatus and method of producing a light-emitting device by using the same apparatus
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Takashi Hamada, Satoshi Seo
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Abstract
The present invention relates to a method for manufacturing a light-emitting device. At least one of a light-emitting film forming step, a conductive film forming step and an insulating film forming step is carried out while holding a substrate in a manner that an angle subtended by a surface of the substrate and the direction of gravity is within a range of from 0 to 30°.
Claims10
A method of producing a light emitting device comprising the steps of:
- forming a light-emitting film on an electrode by continuously applying a solution from a nozzle while changing a relative location between the nozzle and a substrate having the electrode;
- forming a conductive film on the light-emitting film by a sputtering method;
- and
- forming an insulating film on the conductive film by a sputtering method,
- wherein the light-emitting film forming step, the conductive film forming step and the insulating film forming step are carried out while holding the substrate in a manner that an angle subtended by a surface of the substrate and the direction of gravity is within a range of from 0 to 30°.
2 more elements
A method of producing a light-emitting device comprising the steps of:
- forming a light-emitting film on an electrode by continuously applying a solution from a nozzle while changing a relative location between the nozzle and a substrate having the electrode;
- forming a conductive film on the light-emitting film;
- and
- forming an insulating film on the conductive film,
- wherein the light-emitting film forming step is carried out while holding the substrate in a manner that an angle subtended by a surface of the substrate and the direction of gravity is within a range of from 0 to 30°.
2 more elements
Dependencies are inferred from the claim text.