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US 7,915,643 B2Granted
Enhancement mode gallium nitride power devices
AssigneeTransphorm Inc.
InventorsChang Soo Suh, Umesh Mishra
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Abstract
Enhancement mode III-nitride devices are described. The 2DEG is depleted in the gate region so that the device is unable to conduct current when no bias is applied at the gate. Both gallium face and nitride face devices formed as enhancement mode devices.
Claims14
A Ga-face enhancement mode high electrode mobility transistor device, comprising:
- a GaN buffer layer;
- a p-type bottom cap on the GaN buffer layer;
- a GaN channel layer on an opposite side of the bottom cap from the GaN buffer layer;
- an AlxGaN layer on an opposite side of the GaN channel layer from the cap layer;
- a p-type top cap on an opposite side of the AlxGaN layer from the channel layer;
- a top gate adjacent to the top cap;
- a source and a drain;
- and
- an access region between either the source and the gate or the drain and the gate.
6 more elements
Dependencies are inferred from the claim text.