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US 7,915,176 B2Granted
Device comprising a field of tips used in biotechnology applications
AssigneeSTMicroelectronics (Crolles 2) SAS
InventorsOlivier De Sagazan, Matthieu Denoual
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Abstract
A method for manufacturing a device including a field of micrometric tips, including forming a polycrystalline layer on a support; performing an anisotropic plasma etching of all or part of the polycrystalline layer by using a gas mixture including chlorine and helium, whereby tips are formed at the surface of the polycrystalline layer.
Claims14
A method for manufacturing a device comprising a field of sharp micrometric tips, the method comprising:
- forming a crystalline layer on a support such that the crystalline layer comprises a surface;
- and
- anisotropically etching at least a portion of the crystalline layer using a gas mixture comprising at least two gases, said anisotropic etching forming the sharp micrometric tips, at the surface of the crystalline layer, without using a mask in the region where the tips are formed.
Dependencies are inferred from the claim text.