Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsSanae Furuya, Takayoshi Mori, Takahiro Dazai, Ryoichi Takasu, Tomoyuki Hirano
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Abstract
A resist composition for immersion exposure including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon irradiation, and a fluorine-containing compound (C) having a group represented by general formula (c) shown below and containing at least one fluorine atom: wherein Q represents a group in which one hydrogen atom has been removed from a monovalent hydrophilic group; and R1 represents a hydrocarbon group of 2 or more carbon atoms which may have a fluorine atom.
Claims11
A resist composition for immersion exposure comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon irradiation, and a fluorine-containing compound (C) having a group represented by general formula (C-1) shown below
- wherein Q represents a group in which one hydrogen atom has been removed from a monovalent hydrophilic group;
- R2 represents an aromatic cyclic group-containing organic group which may have a fluorine atom, and R3 represents a hydrocarbon group of 2 or more carbon atoms which may have a fluorine atom, with the proviso that at least one of R2 and R3 has a fluorine atom,
- wherein the amount of the fluorine-containing compound (C) is 0.1 to 20 parts by weight, relative to 100 parts by weight of the base component (A).
A fluorine-containing compound comprising at least one compound selected from the group consisting of compounds represented by general formulas (C-1-1) and (C-1-2) shown below:
- wherein R51 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- each of R52 to R55 independently represents a hydrogen atom or a fluorine atom, with the proviso that at least one of R52 to R55 represents a fluorine atom;
- R56 represents a hydrocarbon group of 2 or more carbon atoms which may have a fluorine atom;
- R61 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- each of R62 to R65 independently represents a hydrogen atom or a fluorine atom;
- and R66 represents a hydrocarbon group of 2 or more carbon atoms having a fluorine atom.
A fluorine-containing compound comprising a polymeric compound having a structural unit represented by general formula (c1-1-1) or (c1-1-2) shown below:
- wherein R51 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- each of R52 to R55 independently represents a hydrogen atom or a fluorine atom, with the proviso that at least one of R52 to R55 represents a fluorine atom;
- R56 represents a hydrocarbon group of 2 or more carbon atoms which may have a fluorine atom;
- R61 represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group;
- each of R62 to R65 independently represents a hydrogen atom or a fluorine atom;
- and R66 represents a hydrocarbon group of 2 or more carbon atoms having a fluorine atom.
Dependencies are inferred from the claim text.