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US 7,914,965 B2Granted
Resist composition and method of pattern formation with the same
AssigneeFUJIFILM Corporation
InventorsHyou Takahashi, Kenji Wada
Life of this patent
Estimating the term…
Abstract
A resist composition comprises (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations.
Claims19
A resist composition comprising
- (A) a compound having a molecular weight of 3,000 or lower which has in its molecule a structure having two or more monovalent anions and a structure having two or more monovalent cations;
- and
- further comprising a compound having in its molecule a structure having one monovalent anion,
- a resin selected from (B) a resin which decomposes by the action of an acid to come to have enhanced its solubility in an alkaline developer and (D) a resin soluble in an alkaline developer;
- and
- (H) an organic solvent.
3 more elements
Dependencies are inferred from the claim text.