Particle trap for a plasma source

A particle trap for a remote plasma source, comprising:

• a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet;
• a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet, the gas channel defining a path through the body structure;
• and
• a cooling member in thermal communication with the gas channel that cools at least a portion of the gas channel, resulting in a local temperature gradient in a gas passing through the gas channel that causes particles of the gas to accumulate on the portion of the gas channel.

A method for removing particles from a gas output by a plasma source, comprising:

• receiving at an inlet an activated gas generated by a plasma in a chamber;
• directing the activated gas through a gas channel formed in a body structure configured to cause particles in the activated gas passing from a first portion of the gas channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall, wherein the wall that defines the second portion of the gas channel comprises a material that has a high sticking coefficient, causing particles in the gas to accumulate on the second portion;
• and
• directing the activated gas exiting the gas channel to a process chamber.

A method for removing particles from a gas output by a plasma source, comprising:

• receiving at an inlet an activated gas generated by a plasma in a chamber;
• directing the activated gas through a gas channel formed in a body structure;
• cooling at least a portion of a wall of the gas channel, resulting in a local temperature gradient in the activated gas that causes particles in the activated gas to accumulate on the wall;
• and
• directing the activated gas exiting the gas channel to a process chamber.

A system comprising:

• a remote plasma source;
• a body structure having an inlet for coupling to a chamber of the remote plasma source and an outlet for coupling to an inlet of a process chamber;
• and
• a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet, the gas channel defining a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall, wherein the wall that defines the second portion of the gas channel comprises a material that has a sticking coefficient sufficient to cause particles in the gas to accumulate on the second portion.

A system comprising:

• a remote plasma source;
• a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a plasma chamber inlet;
• a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet;
• and
• a cooling member in thermal communication with the gas channel that cools at least a portion of the gas channel, resulting in a local temperature gradient in a gas passing through the gas channel that causes particles of the gas to accumulate on the portion of the gas channel.

A particle trap for a remote plasma source, comprising:

• a means for receiving at an inlet an activated gas generated by a plasma in a chamber;
• a means for directing the activated gas through a gas channel formed in a body structure configured to cause particles in the activated gas passing from a first portion of the gas channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall;
• and
• a means for cooling at least a portion of the wall, resulting in a local temperature gradient in the activated gas that causes particles in the activated gas to accumulate on the wall.