Positioning apparatus, exposure apparatus and device manufacturing method in which a correction unit corrects a value measured by a selected measuring device

An exposure apparatus in which at least one of a reticle stage and a wafer stage is positioned using a positioning apparatus which positions a stage, the positioning apparatus comprising:

• a measurement system which measures a position of the stage, said measurement system including a plurality of measuring devices which are spaced apart from each other along a first direction and measure a position of the stage in a second direction;
• a switching unit which switches between said measuring devices to measure the position of the stage when the stage moves in at least the first direction;
• and
• a correction unit which corrects, based on an acceleration of the stage, a value measured by said measurement system,
• wherein when said switching unit switches between said plurality of measuring devices, said correction unit corrects, based on a correction value corresponding to an acceleration, a value measured by a measuring device after the switching.

A positioning apparatus which positions a stage, the apparatus comprising:

• a measurement system which measures a position of the stage, said measurement system including a plurality of measuring devices which are spaced apart from each other along a first direction and measure a position of the stage in a second direction;
• a switching unit which switches between said measuring devices to measure the position of the stage when the stage moves in at least the first direction;
• setting unit which, when said switching unit switches between said measuring devices, sets and initial value of said measuring device after switching based on a position of the stage measured by a measuring device before switching;
• and
• a correction unit which corrects the initial value based on information containing the acceleration of the stage.

A positioning apparatus which positions a stage, the apparatus comprising:

• a measurement system which measures a position of the stage, said measurement system including a plurality of measuring devices which are spaced apart from each other along a first direction and measure a position of the stage in a second direction;
• and
• a control apparatus which switches between said measuring devices to measure the position of the stage when the stage moves in at least the first direction,
• wherein, based on a correction amount corresponding to the acceleration of the stage when switching and a measurement value of one measuring device before switching, said control apparatus sets a measurement value of the other measuring device after switching.