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AssigneeHitachi High-Technologies Corporation
InventorsHiroyuki Shindo, Akiyuki Sugiyama, Takumichi Sutani, Hidetoshi Morokuma, Hitoshi Komuro
Estimating the term…
It is an object of the invention to provide a suitable method for identifying depression/protrusion information in a design data; and a program and an apparatus for the same; for example, even in the case that similar portions are arranged, to provide a method for enabling a pattern matching with high precision between the design data and an image obtained by an image formation apparatus or the like; and a program and an apparatus for the same. To attain the above object, a pattern matching method, wherein, using information concerning a depression and/or a protrusion of the pattern on the design data, or a pattern portion and/or a non-pattern portion on the design data, pattern matching is executed between the pattern on the design data and the pattern on said image; and a program for the same are provided.
A pattern matching method for executing matching between a pattern of a design data, and a pattern on an image obtained by an image formation apparatus, comprising steps of;
A non-transitory computer readable medium having instructions embodied thereon, execution of the instructions to cause a computer to carry out functions for pattern matching between a pattern of a design data and a pattern on an image obtained by an image formation apparatus, the functions including;
Dependencies are inferred from the claim text.