Illumination system for illuminating a patterning device and method for manufacturing an illumination system
AssigneeASML Netherlands B.V.
InventorsJan Bernard Plechelmus Van Schoot, Hendricus Johannes Maria Meijer
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Abstract
An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
Claims24
An illumination system comprising:
- a housing;
- and
- an optical system located within the housing, the optical system comprising at least one optical element, the optical system being constructed and arranged to receive a radiation beam as the radiation beam is diverging from an intermediate focus and to illuminate a patterning device with the radiation beam, the intermediate focus being located at a position below a bottom portion of the illumination system.
An assembly comprising:
- an illumination system comprising
- a housing, and
- an optical system located within the housing, the optical system comprising at least one optical element, the optical system being constructed and arranged to receive a radiation beam as the radiation beam is diverging from an intermediate focus and to illuminate a patterning device with the radiation beam, the intermediate focus being located at a position below a bottom portion of the illumination system;
- and
- a source-collector module comprising a radiation source and a collector for imaging the radiation source in the intermediate focus.
A lithographic apparatus comprising:
- an illumination system comprising
- a housing, and
- an optical system located within the housing, the optical system comprising at least one optical element, the optical system being constructed and arranged to receive a radiation beam as the radiation beam is diverging from an intermediate focus and to illuminate a patterning device with the radiation beam, the intermediate focus being located at a position below a bottom portion of the illumination system;
- a source-collector module comprising a radiation source and a collector for imaging the radiation source in the intermediate focus;
- a support constructed to support the patterning device, the patterning device being constructed and arranged to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- and
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate.
A method for manufacturing an illumination system, the method comprising:
- providing a housing with an optical system comprising at least one optical element for imaging an intermediate focus on a patterning device;
- and
- arranging the optical system to receive a radiation beam as the radiation beam is diverging from an intermediate focus and to illuminate the patterning device using the radiation beam, the intermediate focus being located at a position below a bottom portion of the illumination system.
Dependencies are inferred from the claim text.