Immersion lithography apparatus and exposure method
AssigneeKabushiki Kaisha Toshiba
InventorsMakiko Katano, Takuya Kono, Ayako Mizuno
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Abstract
An immersion lithography apparatus includes: a projection optical system which projects a pattern of a mask onto a substrate; a substrate cleaning unit which cleans the substrate prior to projection of the pattern; a liquid supply mechanism which supplies the same liquid to an immersion region between the projection optical system and the substrate and to the substrate cleaning unit; a first liquid discharge path through which the liquid discharged from the immersion region is passed; and a second liquid discharge path through which the liquid discharged from the substrate cleaning unit is passed.
Claims6
An immersion lithography apparatus comprising:
- a projection optical system which projects a pattern of a mask onto a substrate;
- a substrate cleaning unit which is located upstream of the projection optical system and cleans the substrate prior to projection of the pattern;
- a liquid supply mechanism which supplies the same liquid to an immersion region between the projection optical system and the substrate and to the substrate cleaning unit;
- a first liquid discharge path through which the liquid discharged from the immersion region is passed;
- a second liquid discharge path through which the liquid discharged from the substrate cleaning unit is passed;
- and
- identical flow velocity/pressure control units provided in the immersion region between the projection optical system and the substrate and in the substrate cleaning unit.
An exposure method of exposing a substrate by using an immersion lithography apparatus which projects an image of a pattern of a mask onto a substrate through a liquid, the method comprising:
- cleaning a substrate to be exposed with the same liquid as a liquid which is supplied to an immersion region between a projection optical system of the immersion lithography apparatus and the substrate prior to projection of the pattern, in a region other than the immersion region,
- wherein cleaning the substrate is carried out with the same flow velocity and under the same pressure as a flow velocity and a pressure of the liquid which is supplied to the immersion region at the time of projection of the pattern.
Dependencies are inferred from the claim text.