Semiconductor device and producing method of the same

A semiconductor device, comprising:

• a semiconductor substrate having a first surface and a second surface which is positioned on the opposite side of the first surface;
• a through hole which is formed in the semiconductor substrate to connect the first surface and the second surface;
• an active layer which is formed on the first surface of the semiconductor substrate to close the through hole;
• an insulating layer which covers an inner wall surface of the through hole, a bottom surface of the through hole which is closed by the active layer and the second surface of the semiconductor substrate;
• a first opening which is formed in the insulating layer which is present on the bottom surface of the through hole to expose the active layer;
• a second opening which is formed in the insulating layer which is present on the second surface of the semiconductor substrate to expose the second surface;
• a first wiring layer which is formed via the insulating layer ranging from within the through hole onto the second surface of the semiconductor substrate to connect to the active layer through the first opening;
• and
• a second wiring layer which is formed on the second surface of the semiconductor substrate via the insulating layer to surround the first wiring layer which is present on the second surface of the semiconductor substrate,
• wherein the second wiring layer is directly connected with the second surface of the semiconductor substrate through the second opening.