Method for manufacturing a thin film transistor array panel for a liquid crystal display and a photolithography method for fabricating thin films

A thin film transistor (TFT) array panel, comprising:

• a substrate;
• a gate wire formed on the substrate and including a gate line, a gate electrode and a gate pad;
• a gate insulating layer pattern formed on the gate wire;
• a semiconductor layer pattern formed on the gate insulating layer pattern;
• an ohmic contact layer pattern formed on the semiconductor layer pattern;
• a data wire formed on the ohmic contact layer pattern, including a data line, a source electrode, a drain electrode and a data pad, and having a planar shape substantially the same as that of the ohmic contact layer pattern due to simultaneous etching;
• a passivation layer pattern formed on the data wire, having contact holes exposing the gate pad, the data pad and the drain electrode, having a planar shape substantially the same as that of the semiconductor layer pattern due to simultaneous etching except for the portions adjoining the drain electrode and the data pad, having a width greater than that of the data wire, and covering a boundary line of the data wire;
• and
• a pixel electrode electrically connected to the exposed portion of the drain electrode,
• wherein a portion of the pixel electrode is in direct contact with an upper surface of the gate insulating layer pattern.