Measuring energy contamination using time-of-flight techniques
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsBon Woong Koo, Jonathan Gerald England
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AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsBon Woong Koo, Jonathan Gerald England
Estimating the term…
Techniques for measuring energy contamination using time-of-flight (TOF) sensor are disclosed. In one particular exemplary embodiment, the techniques may be realized as a method for detecting energy contamination in an ion beam using time-of-flight comprising directing an ion beam towards an entrance of a sensor, wherein the ion beam may include charged particles and neutral particles, blocking the ion beam periodically from entering the sensor and allowing a pulse of the ion beam to enter the sensor periodically using a gate mechanism, separating the charged particles and the neutral particles of the ion beam pulse based at least in part upon different transit times over a distance caused by variations in at least one of mass and energy associated with the charged particles and the neutral particles, and detecting at least one of the charged particles and the neutral particles separately at a detector based at least in part upon the different transit times.
A method for detecting energy contamination in an ion beam using time-of-flight comprising:
A method for detecting energy contamination in an ion beam using time-of-flight comprising:
Dependencies are inferred from the claim text.