Resist, barc and gap fill material stripping chemical and method
AssigneeAdvanced Technology Materials, Inc.
InventorsDavid D. Bernhard, Yoichiro Fujita, Tomoe Miyazawa, Makoto Nakajima
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Abstract
An aqueous-based composition and process for removing photoresist, bottom anti-reflective coating (BARC) material, and/or gap fill material from a substrate having such material(s) thereon. The aqueous-based composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, and optionally chelating agent and/or surfactant. The composition achieves high-efficiency removal of such material(s) in the manufacture of integrated circuitry without adverse effect on metal species on the substrate, such as copper, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.
Claims32
An aqueous-based removal composition comprising a fluoride source, at least one organic amine, at least one organic solvent, water, optionally at least one chelating agent, and optionally at least one surfactant, wherein the at least one organic amine comprises a species selected from the group consisting of N-(2-cyanoethyl) ethylenediamine, hydroxypropylpiperazine, aminopropylpiperazine, hydroxypropylmorpholine, aminoethylmorpholine, ethylene urea, trimethylaminoethylethanolamine, trimethylaminopropylethanolamine, and N-(2-cyanopropyl) ethylenediamine, and wherein said composition is useful for removing photoresist, bottom anti-reflective coating (BARC) materials, and/or gap fill materials from a substrate having such material(s) thereon.
A method of removing photoresist, BARC material, and/or gap fill material from a substrate having said material(s) thereon, said method comprising contacting the substrate with an aqueous-based removal composition for sufficient time to at least partially remove said material from the substrate, wherein the aqueous-based removal composition includes a fluoride source, at least one organic amine, at least one organic solvent, water, optionally at least one chelating agent, and optionally at least one surfactant, wherein the at least one organic amine comprises a species selected from the group consisting of N-(2-cyanoethyl) ethylenediamine, hydroxypropylpiperazine, aminopropylpiperazine, hydroxypropylmorpholine, aminoethylmorpholine, ethylene urea, trimethylaminoethylethanolamine, trimethylaminopropylethanolamine, and N-(2-cyanopropyl) ethylenediamine
Dependencies are inferred from the claim text.