Method and apparatus for facilitating proximity communication and power delivery

A method that facilitates precise inter-chip alignment for proximity communication and power delivery, comprising:

• placing a shaped structure into an etch pit well located on the surface of a first integrated circuit chip, wherein an etch pit well is an indented region in the surface of an integrated circuit chip;
• substantially aligning a corresponding etch pit well located on the surface of a second integrated circuit chip with the shaped structure;
• and
• mating the shaped structure with the etch pit well located on the surface of the second integrated circuit chip, thereby precisely aligning proximity communication structures in the first integrated circuit chip with corresponding proximity communication structures in the second integrated circuit chip;
• wherein the shaped structure creates a conductive connection between the first integrated circuit chip and the second integrated circuit chip;
• and
• wherein multiple distinct conductive elements with different locations in the etch pit well are used to create the conductive connection, and wherein each conductive element is configured to conduct an electrical signal between the first integrated circuit chip and the second integrated circuit chip through the shaped structure.