Photoresist composition, coating method thereof, method of forming organic film pattern using the same and display device fabricated thereby

A photoresist composition, comprising:

• a polymeric resin with an incorporated polysiloxane resin;
• a photosensitive compound;
• and
• an organic solvent,
• wherein the organic solvent is a mixture of 4-hydroxy-4-methyl-2-pentanone, propylene glycol methyl ether, and ethyl acetoacetate.

A photoresist composition, comprising:

• a polymeric resin with an incorporated polysiloxane resin;
• a photosensitive compound;
• and
• an organic solvent, and
• at least one additive selected from the group consisting of a coloring agent, dye, an anti-striation agent, a plasticizer, an adhesion promoter, and a surfactant,
• wherein the surfactant is a Si-based surfactant or an F-based surfactant.

A photoresist composition, comprising:

• a polymeric resin with an incorporated polysiloxane resin;
• a photosensitive compound;
• and
• an organic solvent, and
• at least one additive selected from the group consisting of a coloring agent, dye, an anti-striation agent, a plasticizer, an adhesion promoter, and a surfactant,
• wherein the surfactant is present in the composition in an amount of 500 to 4,000 ppm.