Back to results
US 7,887,992 B2Granted
Photosensitive paste and process for production of pattern using the same
AssigneeE. I. Du Pont de Nemours and Company
InventorsKazushige Ito, Hiroaki Noda
Life of this patent
Estimating the term…
Abstract
Disclosed is a photosensitive paste comprising a polymerizable monomer and a photopolymerization initiator, wherein the glass transition temperature of the polymerizable monomer is −10° C. or less. The present paste may be used for creating a fine pattern and prevents residue from remaining in the area where paste should be removed.
Claims12
A photosensitive paste, comprising a polymerizable monomer, glass powder, and a photopolymerization initiator,
- wherein the glass transition temperature of the polymerizable monomer is −10° C. or less, wherein the polymerizable monomer contains 3 to 45 of alkoxy groups per compound on average or 200 to 600 of alkylene repeating units per compound on average, and wherein the content of the polymerizable monomer having the glass transition temperature of −10° C. or less is 50 to 100 wt % based on the total weight of polymerizable monomer in the paste.
A process for production of a pattern, comprising steps of:
- applying a photosensitive paste comprising a polymerizable monomer, glass powder, and a photopolymerization initiator, the glass transition temperature of the polymerizable monomer being −10° C. or less, and wherein the polymerizable monomer contains 3 to 45 of alkoxy groups per compound on average or 200 to 600 of alkylene repeating units per compound on average, and wherein the polymerizable monomer having the glass transition temperature of −10° C. or less is 50 to 100 wt % based on the total weight of polymerizable monomer in the applied paste;
- exposing the applied paste to light, which initiates the polymerization of the polymerizable monomer;
- developing the exposed paste, thereby forming a pattern;
- and
- sintering the pattern.
2 more elements
Dependencies are inferred from the claim text.