Amorphous-carbon-based hard multilayer film and hard surface member having the film on surface

An amorphous-carbon-based hard multilayer film formed on a substrate, comprising:

• a base layer formed at a substrate side;
• a surface layer formed at a surface side;
• and
• a compositional gradient layer formed between the base layer and the surface layer,
• wherein the base layer comprises a nitride or a carbo-nitride of an element M expressed by the following formula (1),
• the surface layer comprises an amorphous carbon film comprising C of 50 atomic percent or more, and
• the compositional gradient layer is a layer in which the element M and nitrogen are decreased, and carbon is increased from the base layer to the amorphous carbon film:
• M1-x-yCxNy (1)
• wherein M comprises at least one selected from the group consisting of W, Mo and Ta;
• x and y denote atomic ratios;
• x is 0.5 or less;
• y is 0.03 or more;
• 1-x-y is more than 0, and wherein when a crystal structure of the base layer is examined by X-ray diffraction, an intensity of a maximum peak of an α-W structure, α-Mo structure, or TaN structure is at least five times as large as an intensity of peaks of other crystal structures.