Apparatus for plasma-enhanced chemical vapor deposition (PECVD) of an internal barrier layer inside a container, said apparatus including a gas line isolated by a solenoid valve

A machine for depositing a thin layer of a barrier-effect material on an inside wall of a container by Plasma-Enhanced Chemical Vapor Deposition (PECVD), said machine comprising:

• a processing unit receiving the container and equipped with an electromagnetic wave generator for activating the plasma from a precursor gas;
• a precursor gas inlet;
• an injector for injecting said precursor gas into the container, said injector having a bottom end that opens out into the container and an opposite top end;
• and
• a precursor gas feed duct that puts the precursor gas outlet into fluid flow connection with the top end of the injector;
• wherein said machine further comprises:
• a solenoid valve interposed in the feed duct between the precursor gas outlet and the injector, immediately upstream from the top end of the injector, said solenoid valve having an open configuration in which it allows the precursor gas to pass through from the feed duct to the injector, and a closed configuration in which it prevents the precursor gas from passing through;
• and
• a pressure regulator flow meter interposed between the feed duct and the precursor gas outlet, the pressure regulator flow meter being arranged to operate in synchronization with the solenoid valve so that, when the solenoid valve is in its open configuration, said valve allows the precursor gas to flow through from the feed duct (20) via the regulator flow meter to the injector, and, when said solenoid valve is in its closed configuration, said valve prevents the precursor gas from flowing through.