Pulsed ozone sparging for injecting a high volume high-concentration of ozone
OwnerGerald H. Cresap, Jr.inventor
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OwnerGerald H. Cresap, Jr.inventor
Estimating the term…
An ozone gas source supplies a high pressure ozone gas mixture of an oxygen carrier gas having a high ozone gas concentration of 5-14% of ozone gas to a pulse storage tank. A programmable controller causes a valve means to open and transport the ozone gas mixture within the high pressure pulse storage tank into an injection point when pressure of the ozone gas mixture in the high-pressure pulse storage tank reaches a high discharge pressure site-specific set-point, and causes the valve means to close when pressure within the high pressure pulse storage tank drops and approaches a low pressure site-specific set-point. This process is repeated for injection of a gas pulse into second and subsequent injection points. The high concentration of ozone dissolves a high percentage of ozone into groundwater, producing enhanced oxidation of contaminants and the high gas pressure forces ozone into smaller pores, enhancing contact with contaminants.
A sparging apparatus for treating contaminates within a contaminated sub-surface comprising:
A sparging apparatus for treating a contaminated sub-surface comprising:
A sparging apparatus for treating a contaminated sub-surface comprising:
Dependencies are inferred from the claim text.