Back to results
US 7,887,713 B2Granted
Method for producing an electronic component
AssigneeEpcos AG
InventorChristian Hesse
Life of this patent
Estimating the term…
Abstract
A method includes forming a first electrode and a second electrode on a base body. The Method also includes chemically etching at least a portion of the base body to adjust a resistance of the base body measured between the first electrode and the second electrodes to a predetermined value.
Claims13
A method comprising:
- forming a first electrode and a second electrode made from a first material on a base body made from a second material;
- and
- immersing the base body, the first electrode, and the second electrode in an etching solution directly after having formed the first and the second electrode on the base body, wherein upon immersion at least a portion of the base body is chemically etched and wherein a resistance of the base body between the first electrode and the second electrode is adjusted;
- wherein the first material is etched by the etching solution, and wherein the first material is etched substantially less than the second material.
1 more element
A method comprising:
- forming a first electrode and a second electrode on a base body;
- and
- immersing the base body, the first electrode, and the second electrode in an etching solution directly after having formed the first and the second electrode on the base body, wherein upon immersion at least a portion of the base body is chemically etched and wherein a resistance of the base body between the first electrode and the second electrode is adjusted,
- wherein the first and second electrodes comprise a multilayer metallization comprising a Ag/Ni/Sn layer sequence, and
- wherein the first and second electrodes are etched by the etching solution, and wherein the first and second electrodes are etched substantially less than the base body is etched.
2 more elements
A method comprising:
- forming a first electrode and a second electrode on a base body;
- and
- immersing the base body, the first electrode, and the second electrode in an etching solution directly after having formed the first and the second electrode on the base body, wherein upon immersion at least a portion of the base body is chemically etched and wherein a resistance of the base body between the first electrode and the second electrode is adjusted;
- wherein the first and second electrodes comprise a silver/palladium metallization, and
- wherein the first and second electrodes are etched by the etching solution, and wherein the first and second electrodes are etched substantially less than the base body is etched.
2 more elements
Dependencies are inferred from the claim text.