Method of patterning transparent conductive film, thin film transistor substrate using the same and fabricating method thereof

A method of patterning a transparent conductive film, comprising:

• a first step of preparing an inorganic material substrate;
• a second step of forming an organic film on said substrate;
• a third step of forming a transparent conductive film making an interface with the organic film on said substrate at the remaining area including an area where the organic film is formed, wherein said transparent conductive film is formed to have a thickness of about 500 Å or less and wherein the transparent conductive film has a different crystallization rate depending upon a composition of said inorganic material substrate and a composition of said organic film,
• wherein said third step includes:
• entirely forming the transparent conductive film on said substrate on which the organic film is formed;
• and
• selectively etching the transparent conductive film on the organic film depending upon said crystallization rate of the transparent conductive film.