Method and device for application of particles in an absorbent structure

An apparatus for applying particles within a pre-determined limited area of an absorbent structure, which apparatus comprises:

• a nozzle arranged to dispense the particles on the pre-determined limited area of the absorbent structure;
• conduit for supplying particles by a gas flow from a particle container to the nozzle;
• a valve arranged between the nozzle and the particle container;
• a valve vane arranged to direct the gas flow comprising particles through the valve from a particle inlet to an application outlet when the valve is in a first position and to direct the gas flow comprising particles through the valve from the particle inlet to a residue outlet when the valve is in a second position;
• wherein the apparatus further comprises a device for maintaining a gas flow in the application outlet when the valve is in the second position;
• said device for maintaining a gas flow comprises a particle-free inlet in the valve, which particle-free inlet is arranged to supply a particle-free gas flow;
• wherein the valve vane is formed as a tube flexibly connected to the particle inlet and arranged to direct the particle flow from the particle inlet to the application outlet when the valve is in the first position, and from the particle inlet to the residue outlet when the valve is in the second position;
• and
• wherein the valve vane is arranged to change the direction of the particle-free gas flow through the valve with a change in the valve vane from the first position to the second position, to direct the particle-free gas flow through the valve from the particle-free inlet to the application outlet when the valve is in the second position and to direct the particle-free gas flow from the particle-free inlet to the residue outlet when the valve is in the first position.