Fabricating magnetic read heads with a reduced scratch exposure region

A method of fabricating a read head, the method comprising:

• fabricating a read element and hard bias layers on side regions of the read element, wherein the width of the read element and the hard bias layers define an initial scratch exposure region;
• forming a mask structure on the read element and portions of the hard bias layers proximate to the read element;
• performing a removal process to remove portions of the hard bias layers that are not protected by the mask structure, wherein the width of the read element and the remaining hard bias layers define a final scratch exposure region that is smaller than the initial scratch exposure region;
• depositing insulating material;
• removing the mask structure;
• forming another mask structure on the read element, the remaining portions of the hard bias layers, and portions of the insulating material proximate to the hard bias layers;
• depositing gap fill material;
• and
• removing the other mask structure.

A method of fabricating a read head, the method comprising:

• forming a stripe height and a track width of a read element of the recording head;
• forming hard bias layers on side regions of the read element;
• forming a mask structure that protects the read element and portions of the hard bias layers proximate to the read element;
• removing portions of the hard bias layers exposed by the mask structure;
• depositing insulating material;
• removing the mask structure;
• forming another mask structure on the read element, the remaining portions of the hard bias layers, and portions of the insulating material proximate to the hard bias layers;
• depositing gap fill material;
• and
• removing the other mask structure.