Near-field optical probe based on SOI substrate and fabrication method thereof

A near-field optical probe comprising:

• a cantilever arm support portion formed of a lower silicon layer of a silicon-on-insulator (SOI) substrate, the cantilever arm support portion having a through hole formed therein at a side of the lower silicon layer;
• and
• a cantilever arm formed of a junction oxidation layer pattern and an upper silicon layer pattern on the SOI substrate that are supported on an upper surface of the lower silicon layer and each have a smaller hole than the through hole, a silicon oxidation layer pattern having a tip including an aperture at a vertical end corresponding with the smaller hole on the upper silicon layer pattern, and an optical transmission prevention layer that is formed on the silicon oxidation layer pattern and does not cover the aperture,
• wherein the smaller hole is formed through the junction oxidation layer pattern and the upper silicon layer pattern, and
• wherein the smaller hole exposes the junction oxidation pattern, the upper silicon layer pattern, and the tip including the aperture at the vertical end corresponding with the smaller hole on the upper silicon layer pattern.