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US 7,868,305 B2Granted
Technique for ion beam angle spread control
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsAtul Gupta, Joseph C. Olson
Life of this patent
Estimating the term…
Abstract
A technique for ion beam angle spread control is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for ion beam angle spread control. The method may comprise directing one or more ion beams at a substrate surface at two or more different incident angles, thereby exposing the substrate surface to a controlled spread of ion beam incident angles.
Claims19
A method for ion beam angle spread control, the method comprising:
- directing one or more ion beams at a substrate surface, each of the one or more ion beams having a plurality of beamlets, the plurality of beamlets simultaneously directed at a portion of the substrate surface at with a spread of two or more different incident angles configured to simultaneously expose the portion of the substrate surface to a distribution of incident angles in the plurality of beamlets, wherein said incident angles are adjusted by deflecting said beamlets during beam scanning.
A system for ion beam angle spread control, the system comprising:
- means for directing one or more ion beams at a substrate surface, each of the one or more ion beams having a plurality of beamlets, the plurality of beamlets simultaneously directed at a portion of the substrate surface with a spread of two or more different incident angles configured to simultaneously expose the portion of the substrate surface to a distribution of incident angles in the plurality of beamlets, wherein said incident angles are adjusted by deflecting said beamlets during beam scanning.
Dependencies are inferred from the claim text.