Method of manufacturing electron-emitting device and method of manufacturing image display apparatus

An electron-emitting device manufacturing method comprising:

• a first step of forming a conductive film on an insulating layer having an upper surface and a side surface connected to the upper surface so as to extend from the side surface to the upper surface;
• and
• a second step of etching the conductive film in a film thickness direction, wherein
• at the first step, the conductive film is formed by using a film forming method having directional characteristic such that an angle formed by an incident direction of a material of the conductive film and the side surface of the insulating layer becomes the same as or larger than an angle formed by the incident direction of the material of the conductive film and the upper surface of the insulating layer.

An electron-emitting device manufacturing method comprising:

• a first step of forming a conductive film on an insulating layer having an upper surface and a side surface connected to the upper surface so as to extend from the side surface to the upper surface;
• and
• a second step of etching the conductive film in a film thickness direction, wherein
• at the first step, the conductive film is formed so that film density of a portion of the conductive film on the side surface of the insulating layer becomes equivalent to or higher than film density of a portion of the conductive film on the upper surface of the insulating layer.