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US 7,846,512 B2Granted
Method for producing patterns in a polymer layer
AssigneeCommissariat a l'Energie Atomique
InventorsFrédéric-Xavier Gaillard, Laurent Vandroux
Life of this patent
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Abstract
A method for producing patterns in a polymer layer. Polymer sites are formed on a support. These sites are subjected to a plasma deposition of dielectric material and preferably react with this plasma so as to form openings at the level of said sites. A pattern structure is then formed in the dielectric material and/or in the polymer.
Claims10
A method for producing a pattern structure comprising:
- providing a support comprising polymer sites that react under a plasma deposition atmosphere by preventing plasma deposition on the polymer sites;
- and
- depositing a dielectric material on the support comprising the polymer sites under the plasma deposition atmosphere, wherein the dielectric material deposits on the support and the polymer sites are devoid of the dielectric material.
Dependencies are inferred from the claim text.